Please use this identifier to cite or link to this item:
https://hdl.handle.net/20.500.13091/1584
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yılmaz, Kurtuluş | - |
dc.contributor.author | Şakalak, Hüseyin | - |
dc.contributor.author | Gürsoy, Mehmet | - |
dc.contributor.author | Karaman, Mustafa | - |
dc.date.accessioned | 2021-12-13T10:41:35Z | - |
dc.date.available | 2021-12-13T10:41:35Z | - |
dc.date.issued | 2019 | - |
dc.identifier.issn | 0888-5885 | - |
dc.identifier.uri | https://doi.org/10.1021/acs.iecr.9b02213 | - |
dc.identifier.uri | https://hdl.handle.net/20.500.13091/1584 | - |
dc.description.abstract | The present study demonstrates the successful deposition of poly(ethylhexyl acrylate) thin films in a large-scale closed-batch initiated chemical vapor deposition (iCVD) system. A horizontal cylindrical stainless-steel vacuum tank, which is highly utilized in industrial vacuum applications, was used as iCVD reactor. The effects of substrate temperature, precursor ratio, and pressure on the deposition rates were studied, and the results showed that a deposition rate of 315 nm/min can be achieved in a single run at a reactor pressure of 600 mTorr. At a lower chamber pressure of 400 mTorr, deposition rate decreases, whereas film uniformity increases. By carrying out depositions at successive cycles, thicker films could be obtained, without the need for extensive monomer consumption. The yield percentage was found to be 3.5 for the films deposited in closed-batch system at 400 mTorr, which is 35-fold larger than that of the classical iCVD flow system. | en_US |
dc.description.sponsorship | Scientific and Technological Research Council of Turkey (TUBITAK)Turkiye Bilimsel ve Teknolojik Arastirma Kurumu (TUBITAK) [118M041] | en_US |
dc.description.sponsorship | This study was supported by the Scientific and Technological Research Council of Turkey (TUBITAK) with grant 118M041. | en_US |
dc.language.iso | en | en_US |
dc.publisher | AMER CHEMICAL SOC | en_US |
dc.relation.ispartof | INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH | en_US |
dc.rights | info:eu-repo/semantics/closedAccess | en_US |
dc.subject | Polymers | en_US |
dc.subject | Antibacterial | en_US |
dc.subject | Fabrication | en_US |
dc.subject | Particles | en_US |
dc.subject | Surface | en_US |
dc.subject | Paper | en_US |
dc.subject | Icvd | en_US |
dc.title | Initiated Chemical Vapor Deposition of Poly(Ethylhexyl Acrylate) Films in a Large-Scale Batch Reactor | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1021/acs.iecr.9b02213 | - |
dc.identifier.scopus | 2-s2.0-85070697632 | en_US |
dc.department | Fakülteler, Mühendislik ve Doğa Bilimleri Fakültesi, Kimya Mühendisliği Bölümü | en_US |
dc.authorid | Yilmaz, Kurtulus/0000-0002-6813-6153 | - |
dc.identifier.volume | 58 | en_US |
dc.identifier.issue | 32 | en_US |
dc.identifier.startpage | 14795 | en_US |
dc.identifier.endpage | 14801 | en_US |
dc.identifier.wos | WOS:000481568600020 | en_US |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |
dc.authorscopusid | 57210426921 | - |
dc.authorscopusid | 55764517200 | - |
dc.authorscopusid | 57208454280 | - |
dc.authorscopusid | 35269112600 | - |
dc.identifier.scopusquality | Q1 | - |
item.languageiso639-1 | en | - |
item.fulltext | With Fulltext | - |
item.cerifentitytype | Publications | - |
item.openairetype | Article | - |
item.grantfulltext | embargo_20300101 | - |
item.openairecristype | http://purl.org/coar/resource_type/c_18cf | - |
crisitem.author.dept | 02.01. Department of Chemical Engineering | - |
crisitem.author.dept | 02.01. Department of Chemical Engineering | - |
Appears in Collections: | Mühendislik ve Doğa Bilimleri Fakültesi Koleksiyonu Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collections WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collections |
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acs.iecr.9b02213.pdf Until 2030-01-01 | 2.84 MB | Adobe PDF | View/Open Request a copy |
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