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Browsing by Author "Mercan, Emine Sevgili"

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    Citation - WoS: 4
    Citation - Scopus: 4
    Anti-Fogging Properties of Amphiphilic Copolymer Films Deposited by Chemical Vapor Deposition (cvd)
    (Elsevier, 2024) Tuna, Melek Dinç; Mercan, Emine Sevgili; Gürsoy, Mehmet; Karaman, Mustafa
    This study demonstrates the deposition of an amphiphilic copolymer as an anti-fogging coating on the glass and mirror surfaces. For this purpose, copolymer films of 2,2,2,3,4,4,4,4 hexafluorobutyl acrylate (HFBA) with 2(dimethylamino)ethyl methacrylate (DMAEMA) were synthesized using initiated chemical vapor deposition (iCVD). During the iCVD process by adjusting the flow rate ratio of the monomers, the amount of fluorinated moiety in the P(HFBA-DMAEMA) was systematically tuned, which was confirmed through FTIR and & Oslash;S analyses. According to the water contact angle measurements, coatings were shown to be more hydrophobic with increasing fraction of fluorine atoms in their structures. The P(HFBA-DMAEMA)-deposited surfaces showed outstanding and long-lasting anti-fogging performance while maintaining high optical transmissivity. Films were observed to be functional in terms of anti-fogging behavior even after 1-year from the initial coating process, which confirms the durability of the films.
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    Pressure-Sensitive Adhesive Thin Films with Tailored Properties via Solvent-Free Plasma Deposition of EHA/AA Copolymers
    (Elsevier, 2025) Coplan, Meryem; Gursoy, Mehmet; Mercan, Emine Sevgili; Karaman, Mustafa
    This study employs plasma-enhanced chemical vapor deposition (PECVD) to address the limitations of conventional techniques in fabricating pressure-sensitive adhesive (PSA) thin films and to introduce advanced functionalities. PECVD provides a solvent-free, environmentally sustainable approach, allowing precise control over film composition and properties. PSA thin films were synthesized using varying feed ratios of 2-ethylhexyl acrylate (EHA) and acrylic acid (AA) monomers. The optimized PSA film was synthesized at a substrate temperature of 5 degrees C, reactor pressure of 150 mTorr, plasma power of 50 W, and an AA/EHA monomer flow rate ratio of 1.5. The chemical, physical, and mechanical characteristics of the films were systematically evaluated. The optimized film demonstrated a shear strength of 158 N/cm2 and a peel strength of 0.87 N/25 mm. Furthermore, the film exhibited excellent solvent resistance and high durability.
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